 |
|||||||||||||||||||
 |
|||||||||||||||||||
|
|||||||||||||||||||
|
|||||||||||||||||||
|
|||||||||||||||||||
|
|||||||||||||||||||
|
|||||||||||||||||||
|
|||||||||||||||||||
|
|||||||||||||||||||
|
|||||||||||||||||||
|
|||||||||||||||||||
|
|||||||||||||||||||
|
|||||||||||||||||||
|
|||||||||||||||||||
|
|||||||||||||||||||
|
|||||||||||||||||||
|
|||||||||||||||||||
|
|||||||||||||||||||
|
|||||||||||||||||||
 |
||
| MC2 ACCESS » Infrastructure » Equipment | ||
| Processing View pictures and specifications of our equipment >> Electron Beam Lithography Chalmers and MC2 have many years of experience and are extremely competent in the use of electron beam lithography. Chalmers is the clear leader in EBL in Scandinavia. Currently two JEOL systems are in operation in the cleanroom, including a JBX 9300FS currently writing features down to 8 nm. EBL is one of the most popular processing services that the Laboratory provides to commercial and academic clients, patterning a wide variety of substrates for diverse applications. Thin Film Deposition A wide variety of metal and insulating thin films can be deposited by a number of evaporation and sputter systems. A brand new FHR 150 mm sputter deposition system with 6 targets along with a Lesker Spectros e-beam evaporation system with 8 sources were installed in the Laboratory during 2004. Plasma Processing The Laboratory has a wide assortment of plasma tools for dry etching and deposition. Thermal Processing Chalmers has the ability to thermally process Si wafers up to 150 mm in diameter in its 4 four-stack Centrotherm E2000 furnaces capable of LPCVD, oxidation, drive-in, and annealing. MBE of III-V materials An EPI 930 MBE system is used in the Laboratory predominantly to grow III-V based heterostructures for microwave device applications. The following material combinations are possible: Ga, Al, In / N, P, As |
